Concepedia

Resist Sensitivity

Resist Sensitivity is the minimum electron dose required to induce a defined solubility change in a radiation-sensitive polymer resist, distinguishing it from other lithographic performance metrics by quantifying the efficiency of pattern transfer in electron beam and thin film lithography processes.

645

Publications

18.3K

Citations

1.8K

Authors

329

Institutions

Publications per year

2017–2026

64

Parents

Publications

645

Chemical amplification in the design of dry developing resist materials

Hiroshi Itô, C. Grant Willson · Polymer Engineering and Science · 1983 · 467 citations

, , +16

Radiation Chemistry in Chemically Amplified Resists

Takahiro Kozawa, Seiichi Tagawa · Japanese Journal of Applied Physics · 2010 · 363 citations · Full text

, , +15

Using high-contrast salty development of hydrogen silsesquioxane for sub-10-nm half-pitch lithography

Joel K. W. Yang, Karl K. Berggren · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2007 · 206 citations

, , +13

Resist Materials and Processes for Extreme Ultraviolet Lithography

Toshiro Itani, Takahiro Kozawa · Japanese Journal of Applied Physics · 2012 · 185 citations · Full text

, , +14

High-resolution Positive Resists for Electron-beam Exposure

Istvan Haller, M. Hatzakis, R. Srinivasan · IBM Journal of Research and Development · 1968 · 177 citations

, , +13

1–5 of 645

Authors

1.8K

  1. TK
    Takahiro Kozawa

    The University of Osaka, Japan

    46 publications · 1.9K citations

    23

    h-index

  2. ST
    Seiichi Tagawa

    The University of Osaka, Japan

    41 publications · 1.6K citations

    22

    h-index

  3. TI
    Toshiro Itani

    The University of Osaka, Japan

    30 publications · 957 citations

    19

    h-index

  4. YE
    Yasin Ekinci

    Paul Scherrer Institute, Switzerland

    29 publications · 894 citations

    17

    h-index

  5. MV
    Michaela Vockenhuber

    Paul Scherrer Institute, Switzerland

    17 publications · 545 citations

    15

    h-index

1–5 of 1.8K

Institutions

329

  1. The University of Osaka

    Osaka, Japan

    24 h-index

    151 publications

    5.1K citations

  2. Paul Scherrer Institute

    Villigen, Switzerland

    19 h-index

    105 publications

    3.2K citations

  3. Intel (United States)

    Santa Clara, United States

    18 h-index

    93 publications

    1.9K citations

  4. IBM Research - Thomas J. Watson Research Center

    Yorktown Heights, United States

    17 h-index

    47 publications

    2.1K citations

  5. NTT (Japan)

    Tokyo, Japan

    17 h-index

    62 publications

    1.8K citations

  6. Osaka Research Institute of Industrial Science and Technology

    Osaka, Japan

    17 h-index

    49 publications

    1.4K citations

  7. Cornell University

    Ithaca, United States

    16 h-index

    106 publications

    3.8K citations

  8. IMEC

    Leuven, Belgium

    15 h-index

    72 publications

    1.5K citations

1–8 of 329

Venues

  1. 25

    h-index

  2. 25

    h-index

  3. Japanese Journal of Applied Physics

    JJAP · 62 publications · 2K citations

    24

    h-index

  4. Journal of The Electrochemical Society

    JES · 35 publications · 1.2K citations

    22

    h-index

  5. Journal of Photopolymer Science and Technology

    61 publications · 1.4K citations

    21

    h-index

1–5