Michaela Vockenhuber

Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5nm)

Brian Cardineau, Ryan Del Re, Miles Wilklow‐Marnell et al. · Microelectronic Engineering · 2014 · 169 citations

Materials Science, Engineering, Photochemistry +8

Evaluation of EUV resist performance with interference lithography towards 11 nm half-pitch and beyond

Yasin Ekinci, Michaela Vockenhuber, Mohamad Hojeij et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 78 citations · Full text

Euv Resist Performance, Engineering, Electron-beam Lithography +17

Extreme ultraviolet patterning of tin-oxo cages

Jarich Haitjema, Yù Zhang, Michaela Vockenhuber et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2017 · 66 citations · Full text

Materials Science, Engineering, Electron-beam Lithography +13

Improvements in resist performance towards EUV HVM

Oktay Yildirim, Elizabeth Buitrago, Rik Hoefnagels et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 62 citations · Full text

Electrical Engineering, Engineering, Specific Resistance +14

EUV resists based on tin-oxo clusters

Brian Cardineau, Ryan Del Re, Hashim Al-Mashat et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 57 citations

Engineering, Inorganic Photochemistry, Euv Light +19