Jarich Haitjema

Statistics

Publications

Citations

609

H-Index

Active since

2017

Affiliations

Advanced Research Center for Nanolithography (Netherlands)(Current)

University of Amsterdam

Paul Scherrer Institute

Institute for Molecular Science

Uppsala University

Jarich Haitjema is an author at Advanced Research Center for Nanolithography (Netherlands) specializing in natural sciences, materials science, and materials chemistry.

ORCID

Publications per year

2017–2021

Publications

Key Role of Very Low Energy Electrons in Tin-Based Molecular Resists for Extreme Ultraviolet Nanolithography

Ivan Bespalov, Yu Zhang, Jarich Haitjema et al. · ACS Applied Materials & Interfaces · 2020 · 105 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Absorption coefficient of metal-containing photoresists in the extreme ultraviolet

Roberto Fallica, Jarich Haitjema, Lianjia Wu et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2018 · 93 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +13

Extreme ultraviolet patterning of tin-oxo cages

Jarich Haitjema, Yù Zhang, Michaela Vockenhuber et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2017 · 70 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +14

Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy

Yù Zhang, Jarich Haitjema, Xiaomeng Liu et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2017 · 59 citations · Full text

Natural Sciences, Chemistry, Materials Science +17

Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy

Lianjia Wu, Ivan Bespalov, Katharina Witte et al. · Journal of Materials Chemistry C · 2020 · 54 citations · Full text

Natural Sciences, Chemistry, Materials Science +14

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