B. Cord

Understanding of hydrogen silsesquioxane electron resist for sub-5-nm-half-pitch lithography

Joel K. W. Yang, B. Cord, Huigao Duan et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 180 citations · Full text

Materials Engineering, Materials Science, Wafer Scale Processing +15

Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist

Huigao Duan, Joel K. W. Yang, B. Cord et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2010 · 115 citations · Full text

Engineering, Electron-beam Lithography, Microscopy +21

Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist

Donny Winston, B. Cord, Bin Ming et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 105 citations · Full text

Engineering, Electron-beam Lithography, Microscopy +16

Optimal temperature for development of poly(methylmethacrylate)

B. Cord, Jodie L. Lutkenhaus, Karl K. Berggren · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2007 · 93 citations

Engineering, Responsive Polymers, Polymer Nanocomposites +20

Anisotropic Structure and Transport in Self-Assembled Layered Polymer−Clay Nanocomposites

Jodie L. Lutkenhaus, Elsa Olivetti, Eric Verploegen et al. · Langmuir · 2007 · 72 citations

Engineering, Nanostructured Polymer, Polymer Nanocomposites +19