Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2007 · 93 citations · 7 references
EngineeringResponsive PolymersPolymer NanocompositesChemistryOptimal TemperaturePolymersPolymer MaterialPolymer TechnologyDevelopment TemperaturesPolymer ProcessingThermodynamicsPolymer ChemistryMaterials SciencePolymer StabilityPolymer EngineeringPolymer AnalysisCold Development PeakElectron ResistPolymer ScienceApplied PhysicsPolymer CharacterizationPolymer PropertyPolymerization Kinetics
The authors have investigated a range of poly(methylmethacrylate) (PMMA) development temperatures as low as −70°C and characterized their effect on the resolution of PMMA as an electron resist. The results show that cooling, in addition to reducing the sensitivity of the commonly used positive-tone mode of PMMA, also increases the sensitivity of its less commonly used negative-tone mode. They have shown that the resolution-enhancing properties of cold development peak at approximately −15°C as a result of these competing sensitivity changes. At lower temperatures, the high doses required to expose the resist produce significant cross-linking of the polymer, altering its solubility properties and sharply degrading the contrast. If the correct development temperature is used, however, sub-10nm features are readily achievable in PMMA-based scanning electron-beam lithography.
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Low stress development of poly(methylmethacrylate) for high aspect ratio structures
M. J. Rooks, E. Kratschmer, R. Viswanathan et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 80 citations
Engineering, Electron-beam Lithography, Mechanical Engineering +20