Anett Kolander

UV-NIL with working stamps made from Ormostamp

M. Mühlberger, Iris Bergmair, Anna Klukowska et al. · Microelectronic Engineering · 2008 · 60 citations

Natural Sciences, Fine Arts, Microfabrication +2

Novel transparent hybrid polymer working stamp for UV-imprinting

Anna Klukowska, Anett Kolander, Iris Bergmair et al. · Microelectronic Engineering · 2009 · 37 citations

Natural Sciences, Materials Engineering, Materials Science +10

mr-NIL 6000LT – Epoxy-based curing resist for combined thermal and UV nanoimprint lithography below 50 °C

Christine Schuster, F. Reuther, Anett Kolander et al. · Microelectronic Engineering · 2008 · 15 citations

Engineering, Materials Engineering, Materials Science +14

mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning

S. Pfirrmann, Robert Kirchner, Olga Lohse et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 14 citations

Natural Sciences, Materials Engineering, Materials Science +9

Towards a novel positive tone resist mr-PosEBR for high resolution electron-beam lithography

S. Pfirrmann, Anja Voigt, Anett Kolander et al. · Microelectronic Engineering · 2016 · 13 citations

Engineering, Electrical Engineering, Materials Science +10