Plasma chemistries for high density plasma etching of SiC - Concepedia

Concepedia

Publication | Closed Access

Plasma chemistries for high density plasma etching of SiC

36

Citations

23

References

1999

Year

J. Hong, R. J. Shul, L. Zhang, L. F. Lester, H. Cho, Yoon‐Bong Hahn, David C. Hays, K. B. Jung, S. J. Pearton, Carl‐Mikael Zetterling,

Journal of Electronic Materials

Materials ScienceHigh DensityEngineeringApplied PhysicsPlasma EtchingPlasma ProcessingCarbide

References

	Year	Citations

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