Concepedia

Etch Chemistry

Etch Chemistry is a methodological framework in thin film etching that specifies the chemical reactions and reagent systems employed to selectively remove material at the nanoscale through controlled surface interactions.

2.7K

Publications

105.9K

Citations

9.4K

Authors

1.6K

Institutions

Publications per year

2017–2026

374

Parents

Publications

2.7K

A general Lewis acidic etching route for preparing MXenes with enhanced electrochemical performance in non-aqueous electrolyte

Youbing Li, Hui Shao, Zifeng Lin et al. · Nature Materials · 2020 · 1.6K citations · Full text

, , +16

Electrolytic Shaping of Germanium and Silicon

A. Uhlir · Bell System Technical Journal · 1956 · 1.1K citations

, , +14

Electrochemical etching of Ti<sub>2</sub>AlC to Ti<sub>2</sub>CT<sub>x</sub> (MXene) in low-concentration hydrochloric acid solution

W B Sun, Smit A. Shah, Yexiao Chen et al. · Journal of Materials Chemistry A · 2017 · 800 citations

, , +15

Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etching

J. W. Coburn, Harold F. Winters · Journal of Applied Physics · 1979 · 738 citations

, , +17

Dislocation Etch for (100) Planes in Silicon

F. Secco d' Aragona · Journal of The Electrochemical Society · 1972 · 656 citations

, , +17

1–5 of 2.7K

Authors

9.4K

  1. SJ
    S. J. Pearton

    University of Florida, United States

    57 publications · 1.9K citations

    25

    h-index

  2. EL
    Evelyn L. Hu

    University of California, Santa Barbara, United States

    16 publications · 988 citations

    15

    h-index

  3. IA
    I. Adesida

    University of Illinois Urbana-Champaign, United States

    18 publications · 983 citations

    15

    h-index

  4. FR
    F. Ren

    University of Florida, United States

    20 publications · 505 citations

    14

    h-index

  5. CR
    C. R. Abernathy

    University of Florida, United States

    19 publications · 634 citations

    14

    h-index

1–5 of 9.4K

Institutions

1.6K

  1. Centre National de la Recherche Scientifique

    Paris, France

    27 h-index

    247 publications

    23K citations

  2. University of California, Berkeley

    Berkeley, United States

    25 h-index

    104 publications

    6K citations

  3. AT&T (United States)

    Bedminster, United States

    25 h-index

    182 publications

    7K citations

  4. Massachusetts Institute of Technology

    Cambridge, United States

    25 h-index

    110 publications

    4.3K citations

  5. IBM (United States)

    Armonk, United States

    25 h-index

    96 publications

    5.4K citations

  6. University of Florida

    Gainesville, United States

    22 h-index

    222 publications

    6.4K citations

  7. Chinese Academy of Sciences

    Beijing, China

    22 h-index

    195 publications

    18.4K citations

  8. IBM Research - Thomas J. Watson Research Center

    Yorktown Heights, United States

    20 h-index

    93 publications

    3.6K citations

1–8 of 1.6K

Venues

  1. Applied Physics Letters

    163 publications · 8K citations

    48

    h-index

  2. Journal of The Electrochemical Society

    JES · 231 publications · 9.6K citations

    46

    h-index

  3. Japanese Journal of Applied Physics

    JJAP · 148 publications · 4.2K citations

    34

    h-index

  4. Journal of Applied Physics

    89 publications · 5K citations

    34

    h-index

  5. 34

    h-index

1–5