Publication | Closed Access
Electrolytic Shaping of Germanium and Silicon
1.1K
Citations
8
References
1956
Year
Materials ScienceElectrical EngineeringEngineeringNanoelectronicsApplied PhysicsSiliceneElectrolytic ShapingElectrolyte-semiconductor BarriersSemiconductor MaterialPlasma EtchingElectrolytic EtchingMicroelectronicsOther Localization TechniquesSilicon On InsulatorElectrochemistry
Properties of electrolyte-semiconductor barriers are described, with emphasis on germanium. The use of these barriers in localizing electrolytic etching is discussed. Other localization techniques are mentioned. Electrolytes for etching germanium and silicon are given.
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