Mask aligner lithography simulation – From lithography simulation to process validation

Optimum mask and source patterns to print a given shape

Alan E. Rosenbluth, S. Bukofsky, M. Hibbs et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 111 citations

Image Reconstruction, Engineering, Optimum Mask +19

Advanced mask aligner lithography: new illumination system

Reinhard Voelkel, Uwe Vogler, A. Bich et al. · Optics Express · 2010 · 90 citations · Full text

Proximity Lithography, Engineering, New Illumination System +11

In-situ measurement of dielectric thickness during etching or developing processes

K. Konnerth, F.H. Dill · IEEE Transactions on Electron Devices · 1975 · 56 citations

Photoresist Development Process, Engineering, Dielectric Thickness +17

Resolution enhancement through optical proximity correction and stepper parameter optimization for 0.12-μm mask pattern

Yong-Ho Oh, Jai-Cheol Lee, Sungwoo Lim · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 27 citations

Binary Mask, Stepper Parameter Optimization, Ophthalmology +15

Simulation of proximity printing

Wolfgang Henke, Reinhold Schwalm, J. Pelka · Microelectronic Engineering · 1990 · 25 citations

Engineering, Microfabrication, Digital Fabrication +4