Concepedia

Mask Alignment

Mask Alignment is a photolithographic process step in semiconductor manufacturing that belongs to the class of pattern transfer techniques, distinguished by its precise superposition of a photomask’s circuit pattern onto a substrate’s resist layer to ensure accurate spatial registration of microfabricated features.

232

Publications

8.9K

Citations

890

Authors

259

Institutions

Publications per year

2017–2026

25

Parents

Publications

232

Projection micro-stereolithography using digital micro-mirror dynamic mask

Cheng Sun, Nicholas X. Fang, Dong Wu et al. · Sensors and Actuators A Physical · 2005 · 865 citations

, , +10

Offset masks for lift-off photoprocessing

G. J. Dolan · Applied Physics Letters · 1977 · 692 citations

, , +14

Controlled growth of highly uniform, axial/radial direction-defined, individually addressable InP nanowire arrays

Premila Mohan, Junichi Motohisa, Takashi Fukui · Nanotechnology · 2005 · 211 citations

, , +14

Patterning colloidal films via evaporative lithography.

Daniel Harris, Hua Hu, Jacinta C. Conrad et al. · PubMed · 2007 · 192 citations

, , +15

Automated Brain Tumor Segmentation and Classification in MRI Using YOLO-Based Deep Learning

Maram Fahaad Almufareh, Muhammad Imran, Abdullah Khan et al. · IEEE Access · 2024 · 165 citations · Full text

, , +16

1–5 of 232

Authors

890

  1. HI
    Henry I. Smith

    Massachusetts Institute of Technology, United States

    9 publications · 284 citations

    9

    h-index

  2. UD
    Uwe D. Zeitner

    Fraunhofer Institute for Applied Optics and Precision Engineering, Germany

    7 publications · 275 citations

    7

    h-index

  3. RV
    Reinhard Voelkel

    Suss Microoptics (Switzerland), Switzerland

    6 publications · 267 citations

    6

    h-index

  4. UV
    Uwe Vogler

    Suss Microoptics (Switzerland), Switzerland

    6 publications · 267 citations

    6

    h-index

  5. LS
    Lorenz Stuerzebecher

    Fraunhofer Institute for Applied Optics and Precision Engineering, Germany

    5 publications · 249 citations

    5

    h-index

1–5 of 890

Institutions

259

  1. Massachusetts Institute of Technology

    Cambridge, United States

    10 h-index

    31 publications

    933 citations

  2. Suss Microoptics (Switzerland)

    Neuchâtel, Switzerland

    7 h-index

    19 publications

    875 citations

  3. IBM Research - Thomas J. Watson Research Center

    Yorktown Heights, United States

    6 h-index

    20 publications

    471 citations

  4. MIT Lincoln Laboratory

    Lexington, United States

    6 h-index

    14 publications

    638 citations

  5. SUSS MicroTec (Germany)

    Garching bei München, Germany

    5 h-index

    10 publications

    378 citations

  6. Chinese Academy of Sciences

    Beijing, China

    5 h-index

    24 publications

    643 citations

  7. Fraunhofer Institute for Applied Optics and Precision Engineering

    Jena, Germany

    5 h-index

    17 publications

    838 citations

  8. Korea Advanced Institute of Science and Technology

    Daejeon, South Korea

    5 h-index

    17 publications

    770 citations

1–8 of 259

Venues

  1. 13

    h-index

  2. Journal of Vacuum Science and Technology

    10 publications · 253 citations

    10

    h-index

  3. Applied Optics

    10 publications · 354 citations

    10

    h-index

  4. IEEE Transactions on Electron Devices

    11 publications · 303 citations

    10

    h-index

  5. Sensors and Actuators A Physical

    9 publications · 1.2K citations

    9

    h-index

1–5