Concepedia

Mask Aligner Technology

Mask Aligner Technology is a photolithographic instrumentation system that aligns a photomask to a substrate and transfers microscale patterns through UV light exposure, distinguished by its precision alignment mechanisms and proximity printing capability in semiconductor fabrication processes.

54

Publications

1.8K

Citations

229

Authors

71

Institutions

Publications per year

2017–2026

5

Parents

Publications

54

New Concepts in Projection Mask Aligners

Abe Offner · Optical Engineering · 1975 · 150 citations

, , +12

High-aspect-ratio photolithography for MEMS applications

Hiroshi Miyajima, Mehran Mehregany · Journal of Microelectromechanical Systems · 1995 · 110 citations

, , +15

Optimized SU-8 Processing for Low-Cost Microstructures Fabrication without Cleanroom Facilities

Vânia Pinto, Paulo Sousa, Vanessa F. Cardoso et al. · Micromachines · 2014 · 108 citations · Full text

, , +15

Advanced mask aligner lithography: new illumination system

Reinhard Voelkel, Uwe Vogler, A. Bich et al. · Optics Express · 2010 · 92 citations · Full text

, , +12

Microfabrication of thermoelectric generators on flexible foil substrates as a power source for autonomous microsystems

Wenmin Qu, Matthias Plötner, Wolf‐Joachim Fischer · Journal of Micromechanics and Microengineering · 2001 · 86 citations

, , +15

1–5 of 54

Authors

229

  1. UD
    Uwe D. Zeitner

    Fraunhofer Institute for Applied Optics and Precision Engineering, Germany

    6 publications · 237 citations

    6

    h-index

  2. UV
    Uwe Vogler

    Suss Microoptics (Switzerland), Switzerland

    5 publications · 227 citations

    5

    h-index

  3. LS
    Lorenz Stuerzebecher

    Fraunhofer Institute for Applied Optics and Precision Engineering, Germany

    5 publications · 224 citations

    5

    h-index

  4. RV
    Reinhard Voelkel

    Suss Microoptics (Switzerland), Switzerland

    5 publications · 227 citations

    5

    h-index

  5. TH
    Torsten Harzendorf

    Fraunhofer Institute for Applied Optics and Precision Engineering, Germany

    4 publications · 207 citations

    4

    h-index

1–5 of 229

Institutions

71

  1. Fraunhofer Institute for Applied Optics and Precision Engineering

    Jena, Germany

    7 h-index

    23 publications

    1K citations

  2. Suss Microoptics (Switzerland)

    Neuchâtel, Switzerland

    6 h-index

    17 publications

    795 citations

  3. SUSS MicroTec (Germany)

    Garching bei München, Germany

    4 h-index

    8 publications

    354 citations

  4. Simon Fraser University

    Burnaby, Canada

    2 h-index

    8 publications

    116 citations

  5. Fraunhofer Institute for Integrated Systems and Device Technology

    Erlangen, Germany

    2 h-index

    3 publications

    43 citations

  6. AT&T (United States)

    Bedminster, United States

    2 h-index

    19 publications

    502 citations

  7. IBM Research - Thomas J. Watson Research Center

    Yorktown Heights, United States

    2 h-index

    9 publications

    178 citations

  8. Vorarlberg University of Applied Sciences

    Dornbirn, Austria

    2 h-index

    5 publications

    80 citations

1–8 of 71

Venues

  1. 9

    h-index

  2. Journal of Micromechanics and Microengineering

    JMM · 5 publications · 241 citations

    5

    h-index

  3. Optics Express

    4 publications · 212 citations

    4

    h-index

  4. 3

    h-index

  5. Micromachines

    3 publications · 181 citations

    3

    h-index

1–5