Concepedia

Lithographic Alignment

Lithographic Alignment is a lithographic process parameter that specifies the precise positional correspondence between successive patterning layers in thin film fabrication, distinguished by its reliance on alignment marks and optical or electronic feedback systems to minimize overlay error.

216

Publications

8.6K

Citations

1K

Authors

267

Institutions

Publications per year

2017–2026

22

Parents

Publications

216

Methods for carbon nanotubes synthesis—review

Jan Prášek, Jana Drbohlavová, Jana Chomoucká et al. · Journal of Materials Chemistry · 2011 · 775 citations

, , +17

Position Control in Lithographic Equipment [Applications of Control]

Hans Butler · IEEE Control Systems · 2011 · 402 citations

, , +17

Macroscopic Orientation of Block Copolymer Cylinders in Single‐Layer Films by Shearing

Dan Angelescu, Judith H. Waller, Douglas H. Adamson et al. · Advanced Materials · 2004 · 334 citations

, , +17

Lithographic positioning of self-assembled Ge islands on Si(001)

T. I. Kamins, R. Stanley Williams · Applied Physics Letters · 1997 · 249 citations

, , +15

An ultraprecision stage for alignment of wafers in advanced microlithography

Changwoo Lee, Seung‐Woo Kim · Precision Engineering · 1997 · 160 citations

, , +12

1–5 of 216

Authors

1K

  1. HI
    Henry I. Smith

    Massachusetts Institute of Technology, United States

    10 publications · 304 citations

    10

    h-index

  2. EE
    Euclid E. Moon

    Massachusetts Institute of Technology, United States

    6 publications · 146 citations

    6

    h-index

  3. VG
    Vladimir G. Chigrinov

    Hong Kong University of Science and Technology, Hong Kong SAR China

    5 publications · 227 citations

    5

    h-index

  4. SH
    Song Hu

    Institute of Optics and Electronics, Chinese Academy of Sciences, China

    5 publications · 160 citations

    5

    h-index

  5. HS
    Hoi Sing Kwok

    Hong Kong University of Science and Technology, Hong Kong SAR China

    5 publications · 227 citations

    5

    h-index

1–5 of 1K

Institutions

267

  1. Massachusetts Institute of Technology

    Cambridge, United States

    12 h-index

    53 publications

    1.4K citations

  2. Chinese Academy of Sciences

    Beijing, China

    8 h-index

    38 publications

    1.2K citations

  3. ASML (Netherlands)

    Veldhoven, The Netherlands

    8 h-index

    19 publications

    427 citations

  4. Lawrence Berkeley National Laboratory

    Berkeley, United States

    7 h-index

    42 publications

    928 citations

  5. The University of Texas at Austin

    Austin, United States

    6 h-index

    21 publications

    985 citations

  6. IBM (United States)

    Armonk, United States

    5 h-index

    11 publications

    371 citations

  7. Hong Kong University of Science and Technology

    Hong Kong, Hong Kong

    5 h-index

    24 publications

    885 citations

  8. Institute of Optics and Electronics, Chinese Academy of Sciences

    Chengdu, China

    5 h-index

    22 publications

    794 citations

1–8 of 267

Venues

  1. 15

    h-index

  2. 13

    h-index

  3. Microelectronic Engineering

    17 publications · 322 citations

    13

    h-index

  4. Applied Physics Letters

    11 publications · 854 citations

    11

    h-index

  5. Journal of Vacuum Science and Technology

    7 publications · 133 citations

    7

    h-index

1–5