Position Control in Lithographic Equipment [Applications of Control]

Abstract

This article describes the basic optical principles in the lithographic tool, with the resulting positioning accuracy requirements. For three generations of lithographic tools, the mechatronic architecture and control implications are discussed. Then, six degrees of freedom (DOF) stage control is described with the main focus on actuator force decoupling, allowing the use of classical single-input, single-output (SISO) controllers.