Alternative metals for advanced interconnects

Christoph Adelmann, Liang Wen, Antony Premkumar Peter, Yong Kong Siew, Kristof Croes, Johan Swerts, M. Popovici, Kiroubanand Sankaran, Geoffrey Pourtois, Sven Van Elshocht,

2014 · 90 citations · 2 references

Concepts

Abstract

We discuss the selection criteria for alternative metals in order to fulfill the requirements necessary for interconnects at half pitch values below 10 nm. The performance of scaled interconnects using transition metal germanides and CoAl alloys as metallization are studied and compared to conventional Cu and W interconnects.

References

2