Metals For Interconnects

Metals for Interconnects is a class of conductive materials selectively employed in microfabrication to form electrical connections between components on integrated circuits, distinguished by their optimal combination of electrical conductivity, thermal stability, and compatibility with semiconductor processing techniques.

43

Publications

2.8K

Citations

177

Authors

56

Institutions

Publications per year

2017–2026

5

Authors

177

  1. GP
    Geoffrey Pourtois

    IMEC, Belgium

    2 publications · 152 citations

    2

    h-index

  2. KS
    Kiroubanand Sankaran

    IMEC, Belgium

    2 publications · 152 citations

    2

    h-index

  3. SG
    Shujiang Geng

    Northeastern University, China

    2 publications · 138 citations

    2

    h-index

  4. JW
    Junwei Wu

    Harbin Institute of Technology, China

    2 publications · 132 citations

    2

    h-index

  5. SP
    S. P. Murarka

    Rensselaer Polytechnic Institute, United States

    2 publications · 54 citations

    2

    h-index

1–5 of 177

Venues

  1. Microelectronic Engineering

    7 publications · 250 citations

    7

    h-index

  2. Journal of Power Sources

    3 publications · 143 citations

    3

    h-index

  3. International Journal of Hydrogen Energy

    3 publications · 161 citations

    3

    h-index

  4. Thin Solid Films

    3 publications · 94 citations

    3

    h-index

  5. Electrochimica Acta

    2 publications · 107 citations

    2

    h-index

1–5