Applied Physics Letters · 2000 · 31 citations · 10 references
Natural SciencesMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor MaterialsSpectroscopyLuminescent MaterialsOptical Properties Of SemiconductorsRaman SpectroscopySemiconductor Crystal GrowthSemiconductor PhysicsWide Band Gap SemiconductorsCarrier ConcentrationCathodoluminescence MicroscopyGallium NitrideGallium Nitride (Gan) MaterialsLayer Thickness EffectsSemiconductor Characterization
Cathodoluminescence (CL) and micro-Raman spectroscopy were applied to study microscopically the optical and structural properties of two epitaxial-laterally overgrown GaN structures with tungsten masks in 〈11_00〉 and 〈112_0〉 direction, respectively. A free-carrier concentration higher than 1019 cm−3 was observed right above the masks, leading to a gradient in free-carrier concentration over the whole layer thickness. We used the normalized longitudinal-optical-phonon intensity and the broad band around 650 cm−1 as a measure for the free-electron concentration, which is a promising method to determine the free-carrier concentration justified by the good correlation with CL results.
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