Atomic-scale cellular model and profile simulation of Si etching: Formation of surface roughness and residue

Computer simulation of local order in condensed phases of silicon

Frank H. Stillinger, Thomas A. Weber · Physical review. B, Condensed matter · 1985 · 5.3K citations

Natural Sciences, Materials Science, Physics +16

A survey on the reactive ion etching of silicon in microtechnology

Henri Jansen, Han Gardeniers, M. de Boer et al. · Journal of Micromechanics and Microengineering · 1996 · 473 citations · Full text

Engineering, Materials Engineering, Materials Science +16

On the origin of the notching effect during etching in uniform high density plasmas

Gyeong S. Hwang, Konstantinos P. Giapis · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1997 · 251 citations · Full text

Natural Sciences, Materials Science, Physics +16

Chemical sputtering of Si related to roughness formation of a Cl-passivated Si surface

H. Feil, J. Dieleman, B. J. Garrison · Journal of Applied Physics · 1993 · 119 citations

Natural Sciences, Chemistry, Materials Science +17

Plasma–surface kinetics and simulation of feature profile evolution in Cl2+HBr etching of polysilicon

Weidong Jin, Steven A. Vitale, Herbert H. Sawin · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2002 · 112 citations

Natural Sciences, Materials Engineering, Materials Science +15