Etching-induced Roughness

Etching-Induced Roughness is a type of surface roughness characterized by the topographical irregularities introduced on a material's surface as a direct result of chemical or physical etching processes during manufacturing or material processing.

131

Publications

4.8K

Citations

498

Authors

186

Institutions

Publications per year

2017–2026

17

Authors

498

  1. SJ
    S. J. Pearton

    University of Florida, United States

    4 publications · 87 citations

    4

    h-index

  2. MO
    Motoichi Ohtsu

    Tokyo Institute of Technology, Japan

    3 publications · 140 citations

    3

    h-index

  3. WN
    Wataru Nomura

    The University of Tokyo, Japan

    3 publications · 140 citations

    3

    h-index

  4. TY
    Takashi Yatsui

    The University of Tokyo, Japan

    3 publications · 140 citations

    3

    h-index

  5. VC
    Vassilios Constantoudis

    National Centre of Scientific Research "Demokritos", Greece

    3 publications · 82 citations

    3

    h-index

1–5 of 498

Venues

  1. Journal of The Electrochemical Society

    JES · 10 publications · 230 citations

    10

    h-index

  2. Applied Physics Letters

    6 publications · 182 citations

    6

    h-index

  3. 6

    h-index

  4. Journal of Micromechanics and Microengineering

    JMM · 5 publications · 134 citations

    5

    h-index

  5. Thin Solid Films

    5 publications · 123 citations

    5

    h-index

1–5