Kouichi Ono

Quantitative and comparative characterizations of plasma process-induced damage in advanced metal-oxide-semiconductor devices

Koji Eriguchi, Kouichi Ono · Journal of Physics D Applied Physics · 2008 · 129 citations

Engineering, Materials Science, Physics +17

Solid State Devices and Materials

Seiji Akita, Higashi Seiichiro, Kouichi Ono · Japanese Journal of Applied Physics · 2014 · 87 citations

Natural Sciences, Materials Engineering, Materials Science +12

Numerical study of the etch anisotropy in low-pressure, high-density plasma etching

Mutumi Tuda, Kazuyasu Nishikawa, Kouichi Ono · Journal of Applied Physics · 1997 · 79 citations

Natural Sciences, Materials Engineering, Materials Science +17

Optical and Electrical Characterization of Hydrogen-Plasma-Damaged Silicon Surface Structures and Its Impact on In-line Monitoring

Yoshinori Nakakubo, Asahiko Matsuda, Masanaga Fukasawa et al. · Japanese Journal of Applied Physics · 2010 · 59 citations

Engineering, Materials Engineering, Materials Science +17

An Atomic Scale Model of Multilayer Surface Reactions and the Feature Profile Evolution during Plasma Etching

Yugo Osano, Kouichi Ono · Japanese Journal of Applied Physics · 2005 · 59 citations

Natural Sciences, Materials Engineering, Materials Science +17