Kazuyasu Nishikawa - Concepedia

Author

Kazuyasu Nishikawa

Mitsubishi Electric (Japan)

Also Known As

Kazuyasu NISHIKAWA, Kazuyasu Nishikawa, Kazuyasu Nishikawa Kazuyasu Nishikawa, Nishikawa, Kazuyasu

Publications

328

Citations

H-Index

Concepts

All Affiliations

Mitsubishi Electric (Japan)

About

Kazuyasu Nishikawa is an author at Mitsubishi Electric (Japan) specializing in applied physics, engineering, and surface science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	7	7	249
2	Applied Physics	7	7	249
3	Natural Sciences	3	3	63
4	Chemical Engineering	3	3	74
5	Chemistry	2	2	50

Kazuyasu Nishikawa

Publications

273

Citations

H-Index

Page 1

	Year	Citations
Numerical study of the etch anisotropy in low-pressure, high-density plasma etching Mutumi Tuda, Kazuyasu Nishikawa, Kouichi Ono Journal of Applied Physics EngineeringEtch AnisotropyVacuum DevicePlasma ProcessingNumerical Study	1997	78
Effects of etch products and surface oxidation on profile evolution during electron cyclotron resonance plasma etching of poly-Si Mutumi Tuda, Kouichi Ono, Kazuyasu Nishikawa Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyElectron Cyclotron ResonanceSilicon On InsulatorPlasma Processing	1996	51
Chemical Kinetics of Chlorine in Electron Cyclotron Resonance Plasma Etching of Si Kouichi Ono, Mutumi Tuda, Kazuyasu Nishikawa, Japanese Journal of Applied Physics Chemical EngineeringOptical MaterialsEngineeringPlasma ElectronicsAnalytical Instrumentation	1994	38
Platinum Etching and Plasma Characteristics in RF Magnetron and Electron Cyclotron Resonance Plasmas Kazuyasu Nishikawa, Yoshihiro Kusumi, Tatsuo Oomori, Japanese Journal of Applied Physics EngineeringPlatinum EtchingPlasma PhysicsPlasma ProcessingPlasma Electronics	1993	34
\bfiIn situ Monitoring of Product Species in Plasma Etching by Fourier Transform Infrared Absorption Spectroscopy Kazuyasu Nishikawa, Kouichi Ono Kouichi Ono, Mutumi Tuda, Japanese Journal of Applied Physics EngineeringAbsorption SpectroscopyVacuum DeviceSilicon On InsulatorPlasma Processing	1995	18
Kinetics of etch products and reaction process in electron cyclotron resonance plasma etching of Si Kazuyasu Nishikawa, Tatsuo Oomori, Kouichi Ono Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceChemical EngineeringEngineeringSitu Ftir DiagnosticsSi Etching	1999	18
Hyperons and the H-particle in the color dielectric model Kazuyasu Nishikawa, Nobuaki Aoki, Hiroyuki Hyuga Nuclear Physics A PhysicsNatural SciencesParticle PhysicsQuantum Field TheoryColor Dielectric Model	1991	13
In Situ Fourier Transform Infrared Measurements of Si Surface and Bulk Plasmas in Cl<sub>2</sub>/O<sub>2</sub> and HBr/O<sub>2</sub> Electron Cyclotron Resonance Plasma Etching: Influence of Oxygen on Reaction Products Kazuyasu Nishikawa, Tatsuo Oomori, Kouichi Ono Kouichi Ono, Japanese Journal of Applied Physics Materials SciencePlasma ElectronicsOptical MaterialsBulk PlasmasEngineering	1996	12
Categorization of PBTI Mechanisms on 4H-SiC MOSFETs by the Stress Gate Voltage and Channel Plane Orientation T. Watanabe, Yutaka Fukui, Shiro Hino, IEEE Transactions on Device and Materials Reliability	2023	11

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