Mutumi Tuda

Numerical study of the etch anisotropy in low-pressure, high-density plasma etching

Mutumi Tuda, Kazuyasu Nishikawa, Kouichi Ono · Journal of Applied Physics · 1997 · 78 citations

Engineering, Etch Anisotropy, Vacuum Device +17

Effects of etch products and surface oxidation on profile evolution during electron cyclotron resonance plasma etching of poly-Si

Mutumi Tuda, Kouichi Ono, Kazuyasu Nishikawa · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1996 · 51 citations

Engineering, Electron-beam Lithography, Electron Cyclotron Resonance +16

Measurements of the Cl atom concentration in radio-frequency and microwave plasmas by two-photon laser-induced fluorescence: Relation to the etching of Si

Kouichi Ono, Tatsuo Oomori, Mutumi Tuda et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1992 · 49 citations

Photonics, Cl Atom Concentration, Two-photon Laser-induced Fluorescence +14

Profile evolution during polysilicon gate etching with low-pressure high-density Cl2/HBr/O2 plasma chemistries

Mutumi Tuda, Kenji Shintani, Hiroki Ootera · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2001 · 47 citations

Materials Science, Polysilicon Gate, Engineering +13

Simulation of Ion Trajectories near Submicron-Patterned Surface Including Effects of Local Charging and Ion Drift Velocity toward Wafer

Hiroki Ootera, Tatsuo Oomori, Mutumi Tuda et al. · Japanese Journal of Applied Physics · 1994 · 46 citations

Electrical Engineering, Ion Implantation, Engineering +15