Hiroki Ootera

Profile evolution during polysilicon gate etching with low-pressure high-density Cl2/HBr/O2 plasma chemistries

Mutumi Tuda, Kenji Shintani, Hiroki Ootera · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2001 · 47 citations

Engineering, Electrical Engineering, Materials Science +16

Simulation of Ion Trajectories near Submicron-Patterned Surface Including Effects of Local Charging and Ion Drift Velocity toward Wafer

Hiroki Ootera, Tatsuo Oomori, Mutumi Tuda et al. · Japanese Journal of Applied Physics · 1994 · 46 citations

Natural Sciences, Materials Science, Physics +15

Large-diameter microwave plasma source excited by azimuthally symmetric surface waves

Mutumi Tuda, Kouichi Ono, Hiroki Ootera et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2000 · 29 citations

Natural Sciences, Electrical Engineering, Physics +16

Electrical and optical measurements of electron cyclotron resonance discharges in Cl2 and Ar

Tatsuo Oomori, Mutumi Tuda, Hiroki Ootera et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1991 · 27 citations · Full text

Natural Sciences, Electrical Engineering, Physics +14

Electron cyclotron resonance plasma etching of Si with Cl2: Plasma chemistry and mechanisms

K. Ono, Mutumi Tuda, Hiroki Ootera et al. · Pure and Applied Chemistry · 1994 · 22 citations · Full text

Engineering, Materials Engineering, Materials Science +14