Kouichi Ono Kouichi Ono

Author

Mitsubishi Electric (Japan)

Also Known As

Kouichi ONO, Kouichi Ono Kouichi Ono

Publications

504

Citations

H-Index

Concepts

All Affiliations

Mitsubishi Electric (Japan)Mitsubishi Electric (Germany)

About

Kouichi Ono Kouichi Ono is an author at Mitsubishi Electric (Japan) specializing in surface science, engineering, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	11	12	478
2	Applied Physics	10	11	460
3	Chemical Engineering	4	4	112
4	Chemistry	2	2	30
5	Natural Sciences	1	1	12

Kouichi Ono Kouichi Ono

Publications

478

Citations

H-Index

Page 1

	Year	Citations
Step Coverage and Electrical Properties of (Ba, Sr)TiO<sub>3</sub> Films Prepared by Liquid Source Chemical Vapor Deposition Using TiO(DPM)<sub>2</sub> Takaaki Kawahara, Mikio Yamamuka, Tetsuro Makita, Japanese Journal of Applied Physics Materials ScienceMaterials EngineeringThin Film PhysicsEngineeringTio 3	1994	100
(Ba, Sr)TiO<sub>3</sub> Films Prepared by Liquid Source Chemical Vapor Deposition on Ru Electrodes Takaaki Kawahara, Mikio Yamamuka, Akimasa Yuuki, Japanese Journal of Applied Physics Materials ScienceMaterials EngineeringElectrical EngineeringRu ElectrodesEngineering	1996	95
Surface Morphologies and Electrical Properties of (Ba, Sr)TiO<sub>3</sub> Films Prepared by Two-Step Deposition of Liquid Source Chemical Vapor Deposition Takaaki Kawahara, Mikio Yamamuka, Akimasa Yuuki, Japanese Journal of Applied Physics Materials ScienceTwo-step DepositionEngineeringCrystalline DefectsSurface Morphologies	1995	74
Reaction Mechanism and Electrical Properties of (Ba,Sr)TiO<sub>3</sub> Films Prepared by Liquid Source Chemical Vapor Deposition Mikio Yamamuka, Takaaki Kawahara, Akimasa Yuuki, Japanese Journal of Applied Physics Materials ScienceMaterials EngineeringChemical EngineeringEngineeringOxide Electronics	1996	44
Preparation of (Ba, Sr)TiO<sub>3</sub> Thin Films by Chemical Vapor Deposition Using Liquid Sources Takaaki Kawahara, Mikio Yamamuka, Tetsuro Makita, Japanese Journal of Applied Physics Materials ScienceEngineeringOxide ElectronicsSurface ScienceApplied Physics	1994	38
Mechanisms for Microscopic Nonuniformity in Low-Pressure, High-Density Plasma Etching of Poly-Si in Cl<sub>2</sub> and Cl<sub>2</sub>/O<sub>2</sub> Mixtures Mutumi Tuda, Kouichi Ono Kouichi Ono Japanese Journal of Applied Physics EngineeringElectron-beam LithographyMicroscopic NonuniformityEtch AnisotropyVacuum Device	1997	32
Thermal Desorption Spectroscopy of (Ba, Sr)TiO<sub>3</sub> Thin Films Prepared by Chemical Vapor Deposition Mikio Yamamuka, Takaaki Kawahara, Tetsuro Makita, Japanese Journal of Applied Physics Materials ScienceMaterial AnalysisHigh Temperature MaterialsEngineeringTio 3	1996	19
Profile Evolution during Cold Plasma Beam Etching of Silicon Kouichi Ono Kouichi Ono, Mutumi Tuda Japanese Journal of Applied Physics Materials ScienceMaterials EngineeringEngineeringPhysicsMicrofabrication	1997	18
\bfiIn situ Monitoring of Product Species in Plasma Etching by Fourier Transform Infrared Absorption Spectroscopy Kazuyasu Nishikawa, Kouichi Ono Kouichi Ono, Mutumi Tuda, Japanese Journal of Applied Physics EngineeringAbsorption SpectroscopyVacuum DeviceSilicon On InsulatorPlasma Processing	1995	18
A Mass Spectrometric Study of Reaction Mechanisms in Chemical Vapor Deposition of (Ba, Sr)TiO<sub>3</sub> Films Mikio Yamamuka, Takaaki Kawahara, Tsuyoshi Horikawa, Japanese Journal of Applied Physics EngineeringInorganic PhotochemistryThin Film Process TechnologyChemistryReaction Mechanisms	1997	18

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