Heterojunction p-Cu2O/n-Ga2O3 diode with high breakdown voltage

Tatsuro Watahiki, Yohei Yuda, Akihiko Furukawa, +3

Applied Physics Letters

Materials ScienceSemiconductor TechnologyElectrical EngineeringElectronic DevicesEngineering +10

Vertical Ga₂O₃ Schottky Barrier Diodes With Guard Ring Formed by Nitrogen-Ion Implantation

Chia-Hung Lin, Yohei Yuda, Man Hoi Wong, +8

IEEE Electron Device Letters

Semiconductor TechnologyElectrical EngineeringIon ImplantationEngineeringSemiconductor Device +7

Step Coverage and Electrical Properties of (Ba, Sr)TiO₃ Films Prepared by Liquid Source Chemical Vapor Deposition Using TiO(DPM)₂

Takaaki Kawahara, Mikio Yamamuka, Tetsuro Makita, +4

Japanese Journal of Applied Physics

Materials ScienceMaterials EngineeringThin Film PhysicsEngineeringTio 3 +11

(Ba, Sr)TiO₃ Films Prepared by Liquid Source Chemical Vapor Deposition on Ru Electrodes

Takaaki Kawahara, Mikio Yamamuka, Akimasa Yuuki, +1

Japanese Journal of Applied Physics

Materials ScienceMaterials EngineeringElectrical EngineeringRu ElectrodesEngineering +11

Surface Morphologies and Electrical Properties of (Ba, Sr)TiO₃ Films Prepared by Two-Step Deposition of Liquid Source Chemical Vapor Deposition

Takaaki Kawahara, Mikio Yamamuka, Akimasa Yuuki, +1

Japanese Journal of Applied Physics

Materials ScienceTwo-step DepositionEngineeringCrystalline DefectsSurface Morphologies +12

Vertical GaN merged PiN Schottky diode with a breakdown voltage of 2 kV

Tetsuro Hayashida, Takuma Nanjo, Akihiko Furukawa, +1

Applied Physics Express

Wide-bandgap SemiconductorElectrical EngineeringEngineeringApplied PhysicsPin Schottky Diode +7

Reaction Mechanism and Electrical Properties of (Ba,Sr)TiO₃ Films Prepared by Liquid Source Chemical Vapor Deposition

Mikio Yamamuka, Takaaki Kawahara, Akimasa Yuuki, +1

Japanese Journal of Applied Physics

Materials ScienceMaterials EngineeringChemical EngineeringEngineeringOxide Electronics +11

Preparation of (Ba, Sr)TiO₃ Thin Films by Chemical Vapor Deposition Using Liquid Sources

Takaaki Kawahara, Mikio Yamamuka, Tetsuro Makita, +4

Japanese Journal of Applied Physics

Materials ScienceEngineeringOxide ElectronicsSurface ScienceApplied Physics +7

Novel stacked capacitor technology for 1 Gbit DRAMs with CVD-(Ba,Sr)TiO/sub 3/ thin films on a thick storage node of Ru

Akimasa Yuuki, Mikio Yamamuka, Tetsuro Makita, +8

Materials ScienceNon-volatile MemoryElectrical EngineeringGbit DramsEngineering +12

Modeling of gas-phase and surface reactions in liquid-source chemical-vapor deposition of (Ba,Sr)TiO3 films

Mikio Yamamuka, Takaaki Kawahara, Masayoshi Tarutani, +3

Journal of Applied Physics

EngineeringExperimental ModelsChemistryChemical DepositionChemical Engineering +15