Akimasa Yuuki - Concepedia

Concepedia

Author

Akimasa Yuuki

Mitsubishi Electric (Japan)

Also Known As

A. Yuuki, Akimasa YUUKI, Akimasa Yuuki, Akimasa Yuuki Akimasa Yuuki

49

Publications

1.2K

Citations

18

H-Index

58

Concepts

All Affiliations

Mitsubishi Electric (Japan)Mitsubishi Electric (Germany)Kyoto Institute of Technology

AY

About

Akimasa Yuuki is an author at Mitsubishi Electric (Japan) specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	17	21	1.1K
2	Applied Physics	13	14	943
3	Chemical Engineering	7	7	209
4	Health Sciences	2	2	175
5	Natural Sciences	1	1	27

Akimasa Yuuki

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23

Publications

1.2K

Citations

18

H-Index

	Year	Citations
Temperature dependence of the sticking and loss probabilities of silyl radicals on hydrogenated amorphous silicon Akihisa Matsuda, Katsuhiko Nomoto, Yoshiaki Takeuchi, Surface Science Materials ScienceSilyl RadicalsLoss ProbabilitiesEngineeringPhysics	1990	262
Flame Structure and Diamond Growth Mechanism of Acetylene Torch Yasuji Matsui, Akimasa Yuuki, Mieko Sahara, Japanese Journal of Applied Physics Materials ScienceDiamond-like CarbonRadical EmissionEngineeringPhotochemistry	1989	131
Step Coverage and Electrical Properties of (Ba, Sr)TiO<sub>3</sub> Films Prepared by Liquid Source Chemical Vapor Deposition Using TiO(DPM)<sub>2</sub> Takaaki Kawahara, Mikio Yamamuka, Tetsuro Makita, Japanese Journal of Applied Physics Materials ScienceMaterials EngineeringThin Film PhysicsEngineeringTio 3	1994	100
(Ba, Sr)TiO<sub>3</sub> Films Prepared by Liquid Source Chemical Vapor Deposition on Ru Electrodes Takaaki Kawahara, Mikio Yamamuka, Akimasa Yuuki, Japanese Journal of Applied Physics Materials ScienceMaterials EngineeringElectrical EngineeringRu ElectrodesEngineering	1996	95
Surface Morphologies and Electrical Properties of (Ba, Sr)TiO<sub>3</sub> Films Prepared by Two-Step Deposition of Liquid Source Chemical Vapor Deposition Takaaki Kawahara, Mikio Yamamuka, Akimasa Yuuki, Japanese Journal of Applied Physics Materials ScienceTwo-step DepositionEngineeringCrystalline DefectsSurface Morphologies	1995	74
A Study on Radical Fluxes in Silane Plasma CVD from Trench Coverage Analysis Akimasa Yuuki, Yasuji Matsui, Kunihide Tachibana Japanese Journal of Applied Physics Plasma ElectronicsEngineeringPhysicsSih 3Surface Science	1989	62
Reaction Mechanism and Electrical Properties of (Ba,Sr)TiO<sub>3</sub> Films Prepared by Liquid Source Chemical Vapor Deposition Mikio Yamamuka, Takaaki Kawahara, Akimasa Yuuki, Japanese Journal of Applied Physics Materials ScienceMaterials EngineeringChemical EngineeringEngineeringOxide Electronics	1996	44
Reaction Mechanism of Chemical Vapor Deposition Using Tetraethylorthosilicate and Ozone at Atmospheric Pressure Takaaki Kawahara, Akimasa Yuuki, Yasuji Matsui Japanese Journal of Applied Physics Advanced Oxidation ProcessEngineeringAtmospheric PhotochemistryAtmospheric PressureChemistry	1992	44
P‐51: Dual Directional Backlight for Stereoscopic LCD Tomohiro Sasagawa, Akimasa Yuuki, S. Tahata, SID Symposium Digest of Technical Papers Optical MaterialsEngineeringOphthalmologyHead-mounted DisplayOptical Properties	2003	42
Preparation of (Ba, Sr)TiO<sub>3</sub> Thin Films by Chemical Vapor Deposition Using Liquid Sources Takaaki Kawahara, Mikio Yamamuka, Tetsuro Makita, Japanese Journal of Applied Physics Materials ScienceEngineeringOxide ElectronicsSurface ScienceApplied Physics	1994	38

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