Yugo Osano

An Atomic Scale Model of Multilayer Surface Reactions and the Feature Profile Evolution during Plasma Etching

Yugo Osano, Kouichi Ono · Japanese Journal of Applied Physics · 2005 · 59 citations

Natural Sciences, Materials Engineering, Materials Science +17

Atomic-scale cellular model and profile simulation of poly-Si gate etching in high-density chlorine-based plasmas: Effects of passivation layer formation on evolution of feature profiles

Yugo Osano, Kouichi Ono · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2008 · 41 citations · Full text

Engineering, Materials Engineering, Materials Science +17

A Model Analysis of Feature Profile Evolution and Microscopic Uniformity during Polysilicon Gate Etching in Cl₂/O₂ Plasmas

Yugo Osano, Masahito Mori, Naoshi Itabashi et al. · Japanese Journal of Applied Physics · 2006 · 33 citations

Engineering, Materials Engineering, Materials Science +17

Model analysis of the feature profile evolution during Si etching in HBr-containing plasmas

Masahito Mori, Shoki Irie, Yugo Osano et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2021 · 12 citations

Natural Sciences, Materials Science, Physics +17

Formation mechanisms of etched feature profiles during Si etching in Cl2/O2 plasmas

Masahito Mori, Yugo Osano, Shoki Irie et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2019 · 10 citations

Natural Sciences, Materials Engineering, Materials Science +17