Concepedia
Statistics
Publications
2
Citations
22
H-Index
Active since
2019
Affiliations
Hitachi High-Tech (Japan)(Current)
Kyoto University
Hitachi (Japan)
Shoki Irie is an author at Hitachi High-Tech (Japan) specializing in etch mechanisms, mixing ratio dependence, and physics.
Publications per year
2019–2021
Model analysis of the feature profile evolution during Si etching in HBr-containing plasmas
Masahito Mori, Shoki Irie, Yugo Osano et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2021 · 12 citations
Natural Sciences, Materials Science, Physics +17
Formation mechanisms of etched feature profiles during Si etching in Cl2/O2 plasmas
Masahito Mori, Yugo Osano, Shoki Irie et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2019 · 10 citations
Natural Sciences, Materials Engineering, Materials Science +17
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