Koji Eriguchi

Quantitative and comparative characterizations of plasma process-induced damage in advanced metal-oxide-semiconductor devices

Koji Eriguchi, Kouichi Ono · Journal of Physics D Applied Physics · 2008 · 129 citations

Engineering, Materials Science, Physics +17

True random number generator using current difference based on a fractional stochastic model in 40-nm embedded ReRAM

Zhiqiang Wei, Y. Katoh, Shin Ogasahara et al. · 2016 · 77 citations

Engineering, Computer Engineering, Electrical Engineering +14

Defect generation in electronic devices under plasma exposure: Plasma-induced damage

Koji Eriguchi · Japanese Journal of Applied Physics · 2017 · 66 citations

Engineering, Electrical Engineering, Materials Science +17

Optical and Electrical Characterization of Hydrogen-Plasma-Damaged Silicon Surface Structures and Its Impact on In-line Monitoring

Yoshinori Nakakubo, Asahiko Matsuda, Masanaga Fukasawa et al. · Japanese Journal of Applied Physics · 2010 · 59 citations

Engineering, Materials Engineering, Materials Science +17

Modeling of defect generation during plasma etching and its impact on electronic device performance—plasma-induced damage

Koji Eriguchi · Journal of Physics D Applied Physics · 2017 · 57 citations

Engineering, Materials Science, Physics +17