Concepedia

Etch Uniformity

Etch Uniformity is a metric that quantifies the consistency of material removal across a substrate surface during thin film etching processes, distinguishing itself from other process metrics by its specific focus on spatial variation in etch depth or rate within a single etch step.

173

Publications

6.5K

Citations

622

Authors

175

Institutions

Publications per year

2017–2026

14

Parents

Publications

173

Microscopic uniformity in plasma etching

Richard A. Gottscho, C. W. Jurgensen, D. J. Vitkavage · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1992 · 615 citations

, , +17

The effect of isopropyl alcohol on etching rate and roughness of (1 0 0) Si surface etched in KOH and TMAH solutions

Irena Zubel, M. Kramkowska · Sensors and Actuators A Physical · 2001 · 215 citations

, , +16

Critical tasks in high aspect ratio silicon dry etching for microelectromechanical systems

Ivo W. Rangelow · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2003 · 198 citations

, , +17

Bosch deep silicon etching: improving uniformity and etch rate for advanced MEMS applications

F. Laerme, A. Schilp, K. Funk et al. · 1999 · 170 citations

, , +17

Etch Rates and Selectivities of Citric Acid/Hydrogen Peroxide on GaAs , Al0.3Ga0.7As , In0.2Ga0.8As , In0.53Ga0.47As , In0.52Al0.48As , and InP

G. DeSalvo, Wen Feng Tseng, J. Comas · Journal of The Electrochemical Society · 1992 · 168 citations

, , +17

1–5 of 173

Authors

622

  1. TD
    T. D. Mantéi

    University of Cincinnati, United States

    5 publications · 103 citations

    5

    h-index

  2. DJ
    Demetre J. Economou

    University of Houston, United States

    4 publications · 174 citations

    4

    h-index

  3. GK
    Gon‐Ho Kim

    Seoul National University, South Korea

    4 publications · 85 citations

    4

    h-index

  4. JP
    J. Pender

    University of Michigan, United States

    3 publications · 52 citations

    3

    h-index

  5. SJ
    S. J. Pearton

    University of Florida, United States

    3 publications · 35 citations

    3

    h-index

1–5 of 622

Institutions

175

  1. Lam Research (United States)

    Fremont, United States

    5 h-index

    15 publications

    622 citations

  2. University of Michigan

    Ann Arbor, United States

    5 h-index

    19 publications

    382 citations

  3. University of California, Berkeley

    Berkeley, United States

    5 h-index

    12 publications

    466 citations

  4. University of Cincinnati

    Cincinnati, United States

    5 h-index

    11 publications

    217 citations

  5. AT&T (United States)

    Bedminster, United States

    5 h-index

    21 publications

    2.2K citations

  6. University of Illinois Urbana-Champaign

    Urbana, United States

    4 h-index

    9 publications

    459 citations

  7. IMEC

    Leuven, Belgium

    4 h-index

    9 publications

    193 citations

  8. Kyoto University

    Kyoto, Japan

    4 h-index

    15 publications

    281 citations

1–8 of 175

Venues

  1. Journal of The Electrochemical Society

    JES · 18 publications · 619 citations

    13

    h-index

  2. 13

    h-index

  3. 12

    h-index

  4. Japanese Journal of Applied Physics

    JJAP · 11 publications · 212 citations

    10

    h-index

  5. 10

    h-index

1–5