Richard A. Gottscho

Microscopic uniformity in plasma etching

Richard A. Gottscho, C. W. Jurgensen, D. J. Vitkavage · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1992 · 615 citations

Engineering, Electrical Engineering, Materials Science +17

Overview of atomic layer etching in the semiconductor industry

Keren J. Kanarik, Thorsten Lill, Eric A. Hudson et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2015 · 604 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +15

The Gaseous Electronics Conference radio-frequency reference cell: A defined parallel-plate radio-frequency system for experimental and theoretical studies of plasma-processing discharges

P. J. Hargis, K. E. Greenberg, Paul Miller et al. · Review of Scientific Instruments · 1994 · 332 citations · Full text

Natural Sciences, Electrical Engineering, Microelectronics +14

Negative Ion Kinetics in RF Glow Discharges

Richard A. Gottscho, Carl E. Gaebe · IEEE Transactions on Plasma Science · 1986 · 255 citations

Natural Sciences, Electrical Engineering, Electrochemistry +15

Atomic Layer Etching: Rethinking the Art of Etch

Keren J. Kanarik, Samantha Tan, Richard A. Gottscho · The Journal of Physical Chemistry Letters · 2018 · 232 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17