Thorsten Lill

Overview of atomic layer etching in the semiconductor industry

Keren J. Kanarik, Thorsten Lill, Eric A. Hudson et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2015 · 576 citations · Full text

Engineering, Layer Deposition, Integrated Circuits +17

Predicting synergy in atomic layer etching

Keren J. Kanarik, Samantha Tan, Wenbing Yang et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2017 · 116 citations · Full text

Materials Science, Surface Characterization, Engineering +13

Future of plasma etching for microelectronics: Challenges and opportunities

G. S. Oehrlein, Stephan M. Brandstadter, Robert L. Bruce et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2024 · 103 citations · Full text

Materials Science, Electrical Engineering, Digital Twins +14

Reducing damage to Si substrates during gate etching processes by synchronous plasma pulsing

Camille Petit‐Etienne, Maxime Darnon, Laurent Vallier et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2010 · 73 citations · Full text

Engineering, Plasma Oxidation, Silicon On Insulator +17

Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists

E. Pargon, K. Menguelti, M. Martin et al. · Journal of Applied Physics · 2009 · 71 citations

Ultraviolet Light, Optical Materials, Engineering +23