Robert L. Bruce

Nanoscale lateral displacement arrays for the separation of exosomes and colloids down to 20 nm

Benjamin H. Wunsch, Joshua T. Smith, Stacey M. Gifford et al. · Nature Nanotechnology · 2016 · 561 citations

Colloidal Material, Engineering, Exosomes +8

Fluorocarbon assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma

Dominik Metzler, Robert L. Bruce, Sebastian Engelmann et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2013 · 190 citations · Full text

Engineering, Fluorocarbon Surface Coverage, Chemical Modification +17

Future of plasma etching for microelectronics: Challenges and opportunities

G. S. Oehrlein, Stephan M. Brandstadter, Robert L. Bruce et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2024 · 103 citations · Full text

Materials Science, Electrical Engineering, Digital Twins +14

Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4F8 and Ar/CHF3 plasma

Dominik Metzler, Chen Li, Sebastian Engelmann et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2015 · 102 citations · Full text

Engineering, Atomic Layer Etching, Vacuum Device +18

Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films

Robert L. Bruce, F. Weilnboeck, T. Lin et al. · Journal of Applied Physics · 2010 · 101 citations

Engineering, Mechanical Engineering, Nanoscale Roughness +20