F. Weilnboeck

Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films

Robert L. Bruce, F. Weilnboeck, T. Lin et al. · Journal of Applied Physics · 2010 · 101 citations

Engineering, Mechanical Engineering, Nanoscale Roughness +20

Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193nm photoresist roughening and degradation

D. Nest, David B. Graves, Sebastian Engelmann et al. · Applied Physics Letters · 2008 · 69 citations

Minimal Surface Roughness, Engineering, Microscopy +17

Understanding the Roughening and Degradation of 193 nm Photoresist during Plasma Processing: Synergistic Roles of Vacuum Ultraviolet Radiation and Ion Bombardment

D. Nest, Ting‐Ying Chung, David B. Graves et al. · Plasma Processes and Polymers · 2009 · 60 citations

Engineering, Electron-beam Lithography, Transmission Ftir +20

Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry

F. Weilnboeck, Robert L. Bruce, Sebastian Engelmann et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2010 · 47 citations

Ultraviolet Light, Optical Materials, Engineering +21

Study of 193nm photoresist degradation during short time fluorocarbon plasma exposure. I. Studies of modified layer formation

Masahiro Sumiya, Robert L. Bruce, Sebastian Engelmann et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2008 · 34 citations

Optical Materials, Engineering, Fluorocarbon Plasma Exposure +22