Masahiro Sumiya

Deposition control for reduction of 193nm photoresist degradation in dielectric etching

Naoki Negishi, Hiroki Takesue, Masahiro Sumiya et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2005 · 70 citations

Dielectric Etching, Arf Resist, Engineering +21

Study of 193nm photoresist degradation during short time fluorocarbon plasma exposure. I. Studies of modified layer formation

Masahiro Sumiya, Robert L. Bruce, Sebastian Engelmann et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2008 · 34 citations

Optical Materials, Engineering, Fluorocarbon Plasma Exposure +22

Plasma-surface interactions of advanced photoresists with C4F8∕Ar discharges: Plasma parameter dependencies

Sebastian Engelmann, Robert L. Bruce, Masahiro Sumiya et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 23 citations

Engineering, Glow Discharge, Plasma-surface Interactions +20

Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C4F8- and CF4-based discharges

Sebastian Engelmann, Robert L. Bruce, F. Weilnboeck et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 20 citations

Engineering, Photoresist Surface Modifications, Glow Discharge +17

Planned Maintenance Schedule Update Method for Predictive Maintenance of Semiconductor Plasma Etcher

Shota Umeda, Kenji Tamaki, Masahiro Sumiya et al. · IEEE Transactions on Semiconductor Manufacturing · 2021 · 19 citations

Software Maintenance, Engineering, Industrial Engineering +22