Sebastian Engelmann

Fluorocarbon assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma

Dominik Metzler, Robert L. Bruce, Sebastian Engelmann et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2013 · 190 citations · Full text

Engineering, Fluorocarbon Surface Coverage, Chemical Modification +17

Experimental realization of deep-subwavelength confinement in dielectric optical resonators

Shuren Hu, Marwan Khater, Rafael Salas‐Montiel et al. · Science Advances · 2018 · 179 citations · Full text

Photonics, Plasmonics, Engineering +14

Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-<i>b</i>-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication

Hsinyu Tsai, Jed W. Pitera, Hiroyuki Miyazoe et al. · ACS Nano · 2014 · 153 citations

Engineering, Molecular Self-assembly, Pattern Transfer +17

Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4F8 and Ar/CHF3 plasma

Dominik Metzler, Chen Li, Sebastian Engelmann et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2015 · 102 citations · Full text

Engineering, Atomic Layer Etching, Vacuum Device +18

Density scaling with gate-all-around silicon nanowire MOSFETs for the 10 nm node and beyond

Sarunya Bangsaruntip, Karthik Balakrishnan, S.-L. Cheng et al. · 2013 · 96 citations

Electrical Engineering, Engineering, Physics +13