Chen Li

Atomic Layer Etching at the Tipping Point: An Overview

G. S. Oehrlein, Dominik Metzler, Chen Li · ECS Journal of Solid State Science and Technology · 2015 · 275 citations · Full text

Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4F8 and Ar/CHF3 plasma

Dominik Metzler, Chen Li, Sebastian Engelmann et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2015 · 102 citations · Full text

Engineering, Atomic Layer Etching, Vacuum Device +18

Fluorocarbon based atomic layer etching of Si3N4 and etching selectivity of SiO2 over Si3N4

Chen Li, Dominik Metzler, Chiu-Kin Steven Lai et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2016 · 98 citations · Full text

Engineering, Atomic Layer Etching, Silicon On Insulator +18

Achieving ultrahigh etching selectivity of SiO2 over Si3N4 and Si in atomic layer etching by exploiting chemistry of complex hydrofluorocarbon precursors

Kang-Yi Lin, Chen Li, Sebastian Engelmann et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2018 · 51 citations

Engineering, Atomic Layer Etching, Vacuum Device +21

Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C4F8 and Ar/CHF3 plasma

Dominik Metzler, Chen Li, Sebastian Engelmann et al. · The Journal of Chemical Physics · 2016 · 46 citations · Full text