Excess drain current in heterojunction FETs due to substrate space-charge-limited current

S. Tehrani, H. Goronkin, M.M. Hoogstra, G.N. Maracas, J. Curless, G. Krämer, M.S. Peffley, R. Tsui

IEEE Transactions on Electron Devices · 1989 · 14 citations · 9 references

Concepts

Abstract

A comparison of gated and ungated heterostructure FETs shows that high output conductance, poor pinchoff, and kinks in the I-V characteristics of heterojunction FETs (HFETs) are related to space-charge-limited conduction (SCLC) associated with deep traps in the substrate. The dominant trap level was determined from I-V measurements of an ungated structure as a function of temperature and the trap density was determined from SCLC characteristics. Reduction in excess drain current can be achieved by using a high trap concentration substrate and by increasing the electron barrier between the channel and the substrate.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">&gt;</ETX>

References

9