Concepedia

Pre-amorphization Implantation

Pre-Amorphization Implantation is a semiconductor fabrication technique that involves the intentional implantation of heavy ions to create an amorphous layer in a crystalline substrate prior to subsequent dopant implantation, thereby minimizing channeling effects and enhancing dopant activation uniformity.

69

Publications

1.8K

Citations

360

Authors

94

Institutions

Publications per year

2017–2026

3

Parents

Publications

69

Pre-amorphization damage in ion-implanted silicon

R.J. Schreutelkamp, J. S. Custer, J.R. Liefting et al. · Materials Science Reports · 1991 · 135 citations

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Enhanced strain relaxation in Si/Ge<i>x</i>Si1−<i>x</i>/Si heterostructures via point-defect concentrations introduced by ion implantation

R. Hull, J. C. Bean, J. M. Bonar et al. · Applied Physics Letters · 1990 · 81 citations

, , +17

Three-step amorphisation process in ion-implanted GaN at 15 K

E. Wendler, A. Kamarou, E. Alves et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 2003 · 73 citations

, , +13

Germanium Implantation into Silicon: An Alternate Pre‐Amorphization/Rapid Thermal Annealing Procedure for Shallow Junction Formation

D. K. Sadana, W. Maszara, J. J. Wortmann et al. · Journal of The Electrochemical Society · 1984 · 67 citations

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Titanium Silicide on Si:P With Precontact Amorphization Implantation Treatment: Contact Resistivity Approaching $1 \times 10^{-9}$ Ohm-cm2

Hao Yu, Marc Schaekers, A. Peter et al. · IEEE Transactions on Electron Devices · 2016 · 59 citations

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1–5 of 69

Authors

360

  1. MS
    Marc Schaekers

    IMEC, Belgium

    4 publications · 172 citations

    4

    h-index

  2. NC
    Nadine Collaert

    IMEC, Belgium

    4 publications · 172 citations

    4

    h-index

  3. NH
    Naoto Horiguchi

    IMEC, Belgium

    4 publications · 172 citations

    4

    h-index

  4. HY
    Hao Yu

    IMEC, Belgium

    4 publications · 172 citations

    4

    h-index

  5. KD
    K. De Meyer

    IMEC, Belgium

    4 publications · 172 citations

    4

    h-index

1–5 of 360

Institutions

94

  1. IMEC

    Leuven, Belgium

    8 h-index

    62 publications

    2.5K citations

  2. Chinese Academy of Sciences

    Beijing, China

    5 h-index

    17 publications

    301 citations

  3. KU Leuven

    Leuven, Belgium

    5 h-index

    12 publications

    416 citations

  4. Samsung (South Korea)

    Seoul, South Korea

    4 h-index

    30 publications

    1.1K citations

  5. Institute of Microelectronics

    Beijing, China

    4 h-index

    21 publications

    347 citations

  6. Centre National de la Recherche Scientifique

    Paris, France

    4 h-index

    17 publications

    352 citations

  7. Applied Materials (United States)

    Santa Clara, United States

    3 h-index

    11 publications

    242 citations

  8. Centre d’Élaboration de Matériaux et d’Études Structurales

    Toulouse, France

    3 h-index

    15 publications

    204 citations

1–8 of 94

Venues

  1. 12

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  2. Applied Physics Letters

    7 publications · 193 citations

    7

    h-index

  3. IEEE Transactions on Electron Devices

    6 publications · 211 citations

    6

    h-index

  4. Journal of Applied Physics

    5 publications · 118 citations

    5

    h-index

  5. Journal of The Electrochemical Society

    JES · 4 publications · 146 citations

    4

    h-index

1–5