Multiring Circular Transmission Line Model for Ultralow Contact Resistivity Extraction

Hao Yu, Marc Schaekers, T. Schram, +8

IEEE Electron Device Letters

Numerical AnalysisElectrical EngineeringEngineeringResistorSpecific Resistance +10

Titanium Silicide on Si:P With Precontact Amorphization Implantation Treatment: Contact Resistivity Approaching $1 \times 10^{-9}$ Ohm-cm2

Hao Yu, Marc Schaekers, A. Peter, +15

IEEE Transactions on Electron Devices

Materials ScienceMaterials EngineeringElectrical EngineeringIon ImplantationEngineering +11

A Simplified Method for (Circular) Transmission Line Model Simulation and Ultralow Contact Resistivity Extraction

Hao Yu, Marc Schaekers, T. Schram, +5

IEEE Electron Device Letters

EngineeringMetal ResistanceTransmission SystemElectromagnetic CompatibilitySimplified Method +14

Grain growth kinetics and grain refinement mechanism in Al2O3/WC/TiC/graphene ceramic composite

Xuchao Wang, Jun Zhao, Enzhao Cui, +2

Journal of the European Ceramic Society

Materials ScienceGrain Growth KineticsEngineeringCeramic MaterialMechanical Engineering +4

1.5×10−9 Ωcm2 Contact resistivity on highly doped Si:P using Ge pre-amorphization and Ti silicidation

Hao Yu, Marc Schaekers, Erik Rosseel, +14

Materials EngineeringMaterials ScienceSemiconductor TechnologyElectronic DevicesωCm2 Contact Resistivity +12

Thermal Stability Concern of Metal-Insulator-Semiconductor Contact: A Case Study of Ti/TiO₂/n-Si Contact

Hao Yu, Marc Schaekers, T. Schram, +6

IEEE Transactions on Electron Devices

EngineeringThermal Stability StudyThermal ConductivitySemiconductor DeviceSemiconductors +19

(Invited) Selective Epitaxial Growth of High-P Si:P for Source/Drain Formation in Advanced Si nFETs

Erik Rosseel, Sathish Kumar Dhayalan, Andriy Hikavyy, +14

ECS Transactions

EngineeringSelective Epitaxial GrowthSi Bulk FinfetsSilicon On InsulatorContact Resistance +14

Scheduling Multiple Partially Overlapped Channels in Wireless Mesh Networks

H. Liu, Hao Yu, Xin Liu, +2

Topology ControlCross-layer OptimizationEngineeringOne-hop 802.11Edge Computing +8

Contact resistivities of metal-insulator-semiconductor contacts and metal-semiconductor contacts

Hao Yu, Marc Schaekers, Kathy Barla, +4

Applied Physics Letters

EngineeringSemiconductor DeviceSemiconductorsElectronic DevicesNanoelectronics +15

Ultralow-resistivity CMOS contact scheme with pre-contact amorphization plus Ti (germano-)silicidation

Hao Yu, Marc Schaekers, Andriy Hikavyy, +20

Materials EngineeringMaterials ScienceElectrical EngineeringPma TemperatureEngineering +13