Concepedia
Statistics
Publications
111
Citations
3.7K
H-Index
33
Active since
1995
Affiliations
IMEC(Current)
KU Leuven
Vrije Universiteit Brussel
Applied Materials (United States)
Philips (Belgium)
T. Schram is an author at IMEC specializing in materials science, semiconductor devices, and engineering.
Publications per year
1995–2024
Electrical properties of high-κ gate dielectrics: Challenges, current issues, and possible solutions
Michel Houssa, L. Pantisano, L.-Å. Ragnarsson et al. · Materials Science and Engineering R Reports · 2006 · 276 citations
Natural Sciences, Electrical Engineering, Materials Science +17
Gate-all-around MOSFETs based on vertically stacked horizontal Si nanowires in a replacement metal gate process on bulk Si substrates
Hans Mertens, R. Ritzenthaler, Andriy Hikavyy et al. · 2016 · 198 citations
Engineering, Electrical Engineering, Materials Science +17
Vertically stacked gate-all-around Si nanowire CMOS transistors with dual work function metal gates
Hans Mertens, R. Ritzenthaler, Adrian Chasin et al. · 2016 · 161 citations
Passivation and interface state density of SiO2/HfO2-based/polycrystalline-Si gate stacks
R. J. Carter, E. Cartier, A. Kerber et al. · Applied Physics Letters · 2003 · 119 citations
Engineering, Materials Engineering, Materials Science +17
On the thermal stability of atomic layer deposited TiN as gate electrode in MOS devices
Jörgen Westlinder, T. Schram, L. Pantisano et al. · IEEE Electron Device Letters · 2003 · 115 citations
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