Jörgen Westlinder

On the thermal stability of atomic layer deposited TiN as gate electrode in MOS devices

Jörgen Westlinder, T. Schram, L. Pantisano et al. · IEEE Electron Device Letters · 2003 · 112 citations

Aluminium Nitride, Engineering, Ald Tin +16

Variable work function in MOS capacitors utilizing nitrogen-controlled TiNx gate electrodes

Jörgen Westlinder, Gustaf Sjöblom, Jörgen Olsson · Microelectronic Engineering · 2004 · 90 citations

Electrical Engineering, Chemical Engineering, Engineering +7

Synthesis of c-axis-oriented AlN thin films on high-conducting layers: Al, Mo, Ti, TiN, and Ni

G.F. Iriarte, Johan Bjurström, Jörgen Westlinder et al. · IEEE Transactions on Ultrasonics Ferroelectrics and Frequency Control · 2005 · 66 citations

Materials Science, Materials Engineering, Aluminium Nitride +14

Electrical characterization of aln mis and mim structures

F. Engelmark, Jörgen Westlinder, G.F. Iriarte et al. · IEEE Transactions on Electron Devices · 2003 · 62 citations

Aluminium Nitride, Engineering, Aluminum Nitride +17

Long-term (4 year) degradation behavior of coated stainless steel 441 used for solid oxide fuel cell interconnect applications

Claudia Goebel, Robert Berger, Carlos Bernuy‐López et al. · Journal of Power Sources · 2019 · 51 citations · Full text

Materials Science, Materials Engineering, Chemical Engineering +12