Doping

Doping is the intentional introduction of impurities into a semiconductor material to modify its electrical properties by altering the concentration and type of charge carriers.

50.2K

Publications

2.4M

Citations

129.5K

Authors

7.7K

Institutions

Publications per year

2017–2026

13.7K

Authors

129.5K

  1. SJ
    S. J. Pearton

    University of Florida, United States

    230 publications · 13.6K citations

    55

    h-index

  2. GJ
    G. Jeffrey Snyder

    Northwestern University, United States

    80 publications · 15.2K citations

    53

    h-index

  3. UK
    Umesh K. Mishra

    University of California, Santa Barbara, United States

    93 publications · 7.7K citations

    50

    h-index

  4. CG
    Chris G. Van de Walle

    University of California, Santa Barbara, United States

    80 publications · 19.5K citations

    47

    h-index

  5. MG
    Mercouri G. Kanatzidis

    Northwestern University, United States

    58 publications · 9.1K citations

    45

    h-index

1–5 of 129.5K

Venues

  1. Applied Physics Letters

    5.2K publications · 285K citations

    193

    h-index

  2. Journal of Applied Physics

    4.4K publications · 211.7K citations

    159

    h-index

  3. Physical Review Letters

    PRL · 467 publications · 60.5K citations

    128

    h-index

  4. Physical review. B, Condensed matter

    PRB · 901 publications · 59.8K citations

    117

    h-index

  5. Advanced Materials

    287 publications · 36.6K citations

    113

    h-index

1–5