Kevin J. Nordquist

Imprint lithography for integrated circuit fabrication

Douglas J. Resnick, William J. Dauksher, David P. Mancini et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 120 citations

Engineering, Micromanufacturing, Integrated Circuits +20

Template fabrication schemes for step and flash imprint lithography

T. C. Bailey, Douglas J. Resnick, David P. Mancini et al. · Microelectronic Engineering · 2002 · 106 citations

Materials Science, Engineering, Beam Lithography +5

4H-SiC MESFET with 2.8 W/mm power density at 1.8 GHz

C.E. Weitzel, John W. Palmour, C.H. Carter et al. · IEEE Electron Device Letters · 1994 · 83 citations

Electrical Engineering, 4H-sic Substrates, Engineering +13

Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates

David P. Mancini, K. A. Gehoski, Eric S. Ainley et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 52 citations

Direct Patterning, Engineering, Electron-beam Lithography +22

4H-SiC MESFET with 65.7% power added efficiency at 850 MHz

Karen Moore, C.E. Weitzel, Kevin J. Nordquist et al. · IEEE Electron Device Letters · 1997 · 51 citations

Electrical Engineering, Drain Biases, Engineering +12