Imprint lithography for integrated circuit fabrication

Douglas J. Resnick, William J. Dauksher, David P. Mancini, +8

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

EngineeringMicromanufacturingIntegrated CircuitsWafer Scale ProcessingBeam Lithography +18

Template fabrication schemes for step and flash imprint lithography

T. C. Bailey, Douglas J. Resnick, David P. Mancini, +13

Microelectronic Engineering

Materials ScienceEngineeringBeam LithographyMicrofabricationFabrication Technique +3

4H-SiC MESFET with 2.8 W/mm power density at 1.8 GHz

C.E. Weitzel, John W. Palmour, C.H. Carter, +1

IEEE Electron Device Letters

Electrical Engineering4H-sic SubstratesEngineeringDb GainRf Semiconductor +11

Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates

David P. Mancini, K. A. Gehoski, Eric S. Ainley, +6

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Direct PatterningEngineeringElectron-beam LithographyPattern TransferChemistry +20

4H-SiC MESFET with 65.7% power added efficiency at 850 MHz

Karen Moore, C.E. Weitzel, Kevin J. Nordquist, +4

IEEE Electron Device Letters

Electrical EngineeringDrain BiasesEngineeringRf SemiconductorPower Device +10

Characterization of and imprint results using indium tin oxide-based step and flash imprint lithography templates

William J. Dauksher, Kevin J. Nordquist, David P. Mancini, +9

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Crystal StructureEngineeringImprint ResultsThin Film Process TechnologyNanoengineering +14

High-resolution templates for step and flash imprint lithography

Douglas J. Resnick, William J. Dauksher, David P. Mancini, +10

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyMicroscopyComputer-aided DesignBeam Lithography +16

High Power and High Frequency Silicon Carbide Devices

John W. Palmour, C. H. Carter, C.E. Weitzel, +1

MRS Proceedings

Electrical EngineeringEngineeringPower DeviceHigh PowerPower Semiconductor Device +3

Distortion and overlay performance of UV step and repeat imprint lithography

Jin Choi, Kevin J. Nordquist, Ashuman Cherala, +5

Microelectronic Engineering

Electron-beam LithographyBeam LithographyMicrofabricationRepeat Imprint LithographyUv Step +3

Process development of sub-0.5 μm nonvolatile magnetoresistive random access memory arrays

Kevin J. Nordquist, S. V. Pendharkar, M. Durlam, +5

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Tiny MagnetsNon-volatile MemoryEngineeringEmerging Memory TechnologyMagnetic Resonance +22