William J. Dauksher

Imprint lithography for integrated circuit fabrication

Douglas J. Resnick, William J. Dauksher, David P. Mancini et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 120 citations

Engineering, Micromanufacturing, Integrated Circuits +20

Template fabrication schemes for step and flash imprint lithography

T. C. Bailey, Douglas J. Resnick, David P. Mancini et al. · Microelectronic Engineering · 2002 · 106 citations

Materials Science, Engineering, Beam Lithography +5

&amp;gt;750 mV open circuit voltage measured on 50 <i>μ</i>m thick silicon heterojunction solar cell

Stanislau Herasimenka, William J. Dauksher, Stuart Bowden · Applied Physics Letters · 2013 · 106 citations

Electrical Engineering, Sun Illumination, Engineering +14

ITO/SiOx:H stacks for silicon heterojunction solar cells

Stanislau Herasimenka, William J. Dauksher, Mathieu Boccard et al. · Solar Energy Materials and Solar Cells · 2016 · 69 citations · Full text

Electrical Engineering, Engineering, Organic Solar Cell +6

Model for a multiple-step deep Si etch process

Shahid Rauf, William J. Dauksher, Stephen Clemens et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2002 · 52 citations

Plasma Electronics, Engineering, Vlsi Design +13