Shahid Rauf - Concepedia

Author

Shahid Rauf

Also Known As

Booth, Jean-Paul, Rauf, S., Rauf, Shahid, S Rauf, S. Bobby Rauf, S. Rauf, Saira Rauf, Sana Rauf, Sarah Shamina Abdul Rauf, Shahid Abdur Rauf

280

Publications

4.8K

Citations

H-Index

106

Concepts

All Affiliations

Applied Materials (United States)Motorola (United States)University of Illinois Urbana-Champaign Ruhr University Bochum University of Michigan

About

Shahid Rauf is an author at Applied Materials (United States) specializing in engineering, electrical engineering, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	33	68	4.3K
2	Applied Physics	27	46	3K
3	Natural Sciences	7	7	150
4	Chemical Engineering	3	3	107
5	Business	1	1	16

Shahid Rauf

Publications

4.5K

Citations

H-Index

Page 1

	Year	Citations
The 2017 Plasma Roadmap: Low temperature plasma science and technology Igor Adamovich, Scott Baalrud, Annemie Bogaerts, Journal of Physics D Applied Physics EngineeringPlasma RoadmapPlasma SciencePlasma PhysicsPlasma Modeling	2017	923
The 2012 Plasma Roadmap Seiji Samukawa, Masaru Hori, Shahid Rauf, Journal of Physics D Applied Physics EngineeringPlasma RoadmapPlasma SciencePlasma PhysicsNew Applications	2012	619
Dynamics of a coplanar-electrode plasma display panel cell. I. Basic operation Shahid Rauf, Mark J. Kushner Journal of Applied Physics Pdp CellElectrical EngineeringPlasma ElectronicsEngineeringPhysics	1999	235
Argon metastable densities in radio frequency Ar, Ar/O2 and Ar/CF4 electrical discharges Shahid Rauf, Mark J. Kushner Journal of Applied Physics Electrical EngineeringEngineeringPhysicsGlow DischargePlasma Simulation	1997	208
Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources Shahid Rauf, Mark J. Kushner IEEE Transactions on Plasma Science Electrical EngineeringPlasma CharacteristicsEngineeringIcp ReactorsControlled Nuclear Fusion	1999	105
Future of plasma etching for microelectronics: Challenges and opportunities G. S. Oehrlein, Stephan M. Brandstadter, Robert L. Bruce, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena Materials ScienceElectrical EngineeringDigital TwinsEngineeringPlasma Electronics	2024	103
Self-consistent simulation of very high frequency capacitively coupled plasmas Shahid Rauf, Kallol Bera, Ken Collins Plasma Sources Science and Technology Electron DensityElectrical EngineeringEngineeringRadio FrequencyPhysics	2008	101
Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching S. Banna, Ankur Agarwal, K. Tokashiki, IEEE Transactions on Plasma Science EngineeringPlasma PhysicsPlasma ProcessingPlasma ElectronicsPlasma Simulation	2009	95
A molecular dynamics investigation of fluorocarbon based layer-by-layer etching of silicon and SiO2 Shahid Rauf, T. Sparks, Peter L. G. Ventzek, Journal of Applied Physics EngineeringIntegrated CircuitsChemistrySilicon On InsulatorSemiconductors	2007	86
The effect of radio frequency plasma processing reactor circuitry on plasma characteristics Shahid Rauf, Mark J. Kushner Journal of Applied Physics Plasma CharacteristicsElectrical EngineeringEngineeringPlasma ElectronicsRadio Frequency	1998	80

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