Seiji Samukawa - Concepedia

Author

Seiji Samukawa

Also Known As

C.-T. Wu, Garrett Rose, Rahman, M.M., S Samukawa, S. Samukawa, S. Tsukada, SEIJI SAMUKAWA, Samukawa, Seiji, Sei Samukawa, Seiji SAMUKAWA

670

Publications

8.8K

Citations

H-Index

181

Concepts

All Affiliations

Tohoku University NEC (Japan)National Yang Ming Chiao Tung University National Institute of Advanced Industrial Science and Technology Advanced Institute of Materials Science

About

Seiji Samukawa is an author at Tohoku University specializing in engineering, applied physics, and electrical engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	39	197	7.5K
2	Natural Sciences	16	20	1.1K
3	Health Sciences	2	2	52
4	Medicine	1	1	86
5	Social Sciences	1	1	21

Seiji Samukawa

214

Publications

Citations

H-Index

Page 1

	Year	Citations
The 2017 Plasma Roadmap: Low temperature plasma science and technology Igor Adamovich, Scott Baalrud, Annemie Bogaerts, Journal of Physics D Applied Physics EngineeringPlasma RoadmapPlasma SciencePlasma PhysicsPlasma Modeling	2017	923
The 2012 Plasma Roadmap Seiji Samukawa, Masaru Hori, Shahid Rauf, Journal of Physics D Applied Physics EngineeringPlasma RoadmapPlasma SciencePlasma PhysicsNew Applications	2012	619
The 2022 Plasma Roadmap: low temperature plasma science and technology Igor Adamovich, Sumit Agarwal, Eduardo Ahedo, Journal of Physics D Applied Physics EngineeringPlasma RoadmapPlasma SciencePlasma PhysicsPlasma Processing	2022	472
Generating high-efficiency neutral beams by using negative ions in an inductively coupled plasma source Seiji Samukawa, Keisuke Sakamoto, Katsunori Ichiki Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Electrical EngineeringIon ImplantationEngineeringPlasma SourceNeutralization Efficiency	2002	170
Pulse-time modulated plasma discharge for highly selective, highly anisotropic and charge-free etching Seiji Samukawa, Tetsu Mieno Plasma Sources Science and Technology Selective EtchingEngineeringPulse TimingPlasma PhysicsIon Implantation	1996	152
Ultimate Top-down Etching Processes for Future Nanoscale Devices: Advanced Neutral-Beam Etching Seiji Samukawa Japanese Journal of Applied Physics EngineeringElectron-beam LithographyPlasma ProcessingAdvanced Neutral-beam EtchingBeam Lithography	2006	141
Time-modulated electron cyclotron resonance plasma discharge for controlling generation of reactive species Seiji Samukawa, Shuichi Furuoya Applied Physics Letters Optical MaterialsEngineeringGlow DischargePlasma PhysicsElectron Cyclotron Resonance	1993	115
Pulse–time-modulated electron cyclotron resonance plasma discharge for highly selective, highly anisotropic, and charge-free etching Seiji Samukawa, Hiroto Ohtake, Tetsu Mieno Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringGlow DischargePlasma PhysicsElectron Cyclotron ResonancePlasma Electronics	1996	103
Highly Selective and Highly Anisotropic SiO<sub>2</sub> Etching in Pulse-Time Modulated Electron Cyclotron Resonance Plasma Seiji Samukawa Japanese Journal of Applied Physics Sio 2Plasma ElectronicsEngineeringPhysicsMicrofabrication	1994	88
Expression of heme oxygenase‐1 in human leukemic cells and its regulation by transcriptional repressor Bach1 Takuya Miyazaki, Yohei Kirino, Mitsuhiro Takeno, Cancer Science Cnc Homology 1Mixed-phenotype Acute LeukemiaImmunologyCell DeathPrimary Aml Cells	2010	86

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