Tetsu Mieno

Pulse-time modulated plasma discharge for highly selective, highly anisotropic and charge-free etching

Seiji Samukawa, Tetsu Mieno · Plasma Sources Science and Technology · 1996 · 152 citations

Engineering, Electrical Engineering, Physics +14

Pulse–time-modulated electron cyclotron resonance plasma discharge for highly selective, highly anisotropic, and charge-free etching

Seiji Samukawa, Hiroto Ohtake, Tetsu Mieno · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1996 · 105 citations

Engineering, Electrical Engineering, Physics +14

Ultrastrong Stationary Double Layers in a Nondischarge Magnetoplasma

Noriyoshi Sato, Rikizo Hatakeyama, Satoru Iizuka et al. · Physical Review Letters · 1981 · 82 citations · Full text

Natural Sciences, Physics, Condensed Matter Physics +11

Ultralow friction and wear behaviour of Ni/Y-based single wall carbon nanotubes (SWNTs)

L. Joly-Pottuz, Fabrice Dassenoy, Béatrice Vacher et al. · Tribology International · 2004 · 75 citations

Engineering, Materials Engineering, Materials Science +16

Production of C60 plasma

Naoyuki Sato, Tetsu Mieno, Takamichi Hirata et al. · Physics of Plasmas · 1994 · 64 citations · Full text

Natural Sciences, Materials Science, Physics +16