Hiroto Ohtake

Pulse–time-modulated electron cyclotron resonance plasma discharge for highly selective, highly anisotropic, and charge-free etching

Seiji Samukawa, Hiroto Ohtake, Tetsu Mieno · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1996 · 103 citations

Engineering, Glow Discharge, Plasma Physics +16

Two-Dimensional Self-Consistent Simulation of a DC Magnetron Discharge

Eiji Shidoji, Hiroto Ohtake, Nobuhiko Nakano et al. · Japanese Journal of Applied Physics · 1999 · 64 citations

Electrical Engineering, Engineering, Physics +12

Prediction of UV spectra and UV-radiation damage in actual plasma etching processes using on-wafer monitoring technique

Butsurin Jinnai, Seiichi Fukuda, Hiroto Ohtake et al. · Journal of Applied Physics · 2010 · 58 citations

Ultraviolet Light, Electrical Engineering, Optical Materials +15

Charge-free etching process using positive and negative ions in pulse-time modulated electron cyclotron resonance plasma with low-frequency bias

Hiroto Ohtake, Seiji Samukawa · Applied Physics Letters · 1996 · 49 citations

Electrical Engineering, Low-frequency Bias, Engineering +15

Simulation of a Pulse Time-Modulated Bulk Plasma in Cl₂

Ayumi Yokozawa, Hiroto Ohtake, Seiji Samukawa · Japanese Journal of Applied Physics · 1996 · 31 citations

Electron Density, Plasma Electronics, Engineering +14