Concepedia

Author

Seiichi Fukuda

Tohoku University

Also Known As

Seiichi FUKUDA, Seiichi Fukuda, Seiichi Fukuda Seiichi Fukuda

14

Publications

271

Citations

7

H-Index

24

Concepts

All Affiliations

Tohoku UniversitySony Corporation (United States)
SF

About

Seiichi Fukuda is an author at Tohoku University specializing in applied physics, engineering, and materials science.

Top Concepts

#ConceptH-IndexPublicationsCitations

1

Engineering

6

6

248

2

Applied Physics

6

6

248

3

Materials Science

4

4

96

4

Electrical Engineering

3

3

112

5

Physics

1

1

94

Seiichi Fukuda

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6

Publications

248

Citations

6

H-Index

YearCitations

Radiation Damage of SiO<sub>2</sub> Surface Induced by Vacuum Ultraviolet Photons of High-Density Plasma

Tetsuya Tatsumi, Seiichi Fukuda, S. Kadomura

Japanese Journal of Applied Physics

1994

94

Prediction of UV spectra and UV-radiation damage in actual plasma etching processes using on-wafer monitoring technique

Butsurin Jinnai, Seiichi Fukuda, Hiroto Ohtake,

Journal of Applied Physics

2010

58

Etch Rate Acceleration of SiO<sub>2</sub> during Wet Treatment after Gate Etching

Tetsuya Tatsumi, Seiichi Fukuda, S. Kadomura

Japanese Journal of Applied Physics

1993

30

Nitrogen doping and thermal stability in HfSiOxNy studied by photoemission and x-ray absorption spectroscopy

Satoshi Toyoda, Jun Okabayashi, H. Takahashi,

Applied Physics Letters

2005

30

Control of nitrogen depth profile in ultrathin oxynitride films formed by pulse-time-modulated nitrogen beams

Seiji Samukawa, Youichi Minemura, Seiichi Fukuda

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

2004

24

Ultrathin Oxynitride Films Formed by Using Pulse-Time-Modulated Nitrogen Beams

Seiji Samukawa, Youichi Minemura, Seiichi Fukuda

Japanese Journal of Applied Physics

2003

12

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