Concepedia

Seiichi Fukuda

SF

6

Publications

248

Citations

6

H-Index

1993

Active since

Affiliations

Tohoku University(Current)

Sony Corporation (United States)

Seiichi Fukuda is an author at Tohoku University specializing in applied physics, engineering, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial ScienceThin FilmsSurface ScienceMicroelectronicsElectrical EngineeringPulse PowerOptoelectronic DevicesPhysics

Publications per year

1993–2010

6

Publications

6

Radiation Damage of SiO<sub>2</sub> Surface Induced by Vacuum Ultraviolet Photons of High-Density Plasma

Tetsuya Tatsumi, Seiichi Fukuda, S. Kadomura · Japanese Journal of Applied Physics · 1994 · 94 citations

Engineering, Plasma Physics, Vacuum Device +16

Prediction of UV spectra and UV-radiation damage in actual plasma etching processes using on-wafer monitoring technique

Butsurin Jinnai, Seiichi Fukuda, Hiroto Ohtake et al. · Journal of Applied Physics · 2010 · 58 citations

Ultraviolet Light, Electrical Engineering, Optical Materials +15

Etch Rate Acceleration of SiO<sub>2</sub> during Wet Treatment after Gate Etching

Tetsuya Tatsumi, Seiichi Fukuda, S. Kadomura · Japanese Journal of Applied Physics · 1993 · 30 citations

Materials Science, Gate Etching, Electrical Engineering +13

Nitrogen doping and thermal stability in HfSiOxNy studied by photoemission and x-ray absorption spectroscopy

Satoshi Toyoda, Jun Okabayashi, H. Takahashi et al. · Applied Physics Letters · 2005 · 30 citations · Full text

Materials Science, X-ray Spectroscopy, Engineering +14

Control of nitrogen depth profile in ultrathin oxynitride films formed by pulse-time-modulated nitrogen beams

Seiji Samukawa, Youichi Minemura, Seiichi Fukuda · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2004 · 24 citations

Engineering, Optoelectronic Devices, Pulse-time-modulated Nitrogen Beams +16

Rows per page

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